Author(s)

St. lovan, I. Boca & A. lovan

Abstract

A search program for calculating accurately the roughness parameters as rms values of surface roughness a and surface slopes m for a silicon and thin film deposited on it as a function of the experimental ellipsometric parameters A and *P is presented. The programs contain routines and subroutines of complex functions for the calculation of the rough parameters. The results for the silicon surfaces prepared by industrial methods show systematic variations in the measured ellipsometric parameters. These variations persisted even after the surface composition was changed by oxide rising on the surfaces. The paper also discusses the factors that limit the accuracy of the ellipsometric method. Introduction One subject in the field of quality contr

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