Author(s)

R. Briick & K. Hahn

Abstract

As a lithography based method to develop microstructures LIGA technique needs mask layout data as a result of design and as an input for production. Within the stage of design, layout and design rules represent technological con- straints for the designer and form an interface between design creation and fab- rication. Therefore the correctness of a LIGA mask layout with respect to a given set of design rules is essential to avoid failures during fabrication and to save costly and time-consuming redesign and production cycles. This paper describes a CAD tool for an automated check of LIGA mask data with regard to design rule violations. This design verification helps the designer decide, whether the designed mask layout fulfils the requirements of fabrication. 1 Introduction Lithography based techniques

Keywords