Author(s)

M. Djafari Rouhani, R. Malek, A.M. Gue, A. Esteve, H. Idrissi-Saba, Z. Moktadir & H. Camon

Abstract

The need for a new generation of Technology CAD tools based on atomic scale modelling to meet the future needs of the microelectronic industry for the sub micron devices and the microsystems design has been described. It is stated how a cascade of different types of modelling going from the basic atomistic level to macroscopic continuum can be linked together, each feeding parameters into the higher level modelling. Four examples of fields in which we have been involved are given. The heteroepitaxial growth where the strain

Keywords