WIT Press


Growth Behavior Of Nitride Layers Formed On Chromium Electrodeposit In Plasma-nitriding

Price

Free (open access)

Paper DOI

10.2495/MC030301

Volume

43

Pages

10

Published

2003

Size

469.20 kb

Author(s)

S. C. Kwon, K. S. Nam, J. Y. Eom, V. Shankar Rao & H. S. Kwon

Abstract

The structural and compositional analysis on nitrides formed on an electroplated hard Cr layer during plasma-nitriding was conducted, and its growth kinetics was examined as a function of the plasma-nitriding temperature and time in order to establish a computer simulation model prediction for the growth behavior of the Cr-nitride layer. The Cr-nitrides formed during the plasma-nitriding at 550- 720 O C are composed of outer CrN and inner Cr2N layers. A nitrogen diffusion model in the multi-layer, based on fixed grid Finite Difference Method was applied to siinulate the growth kinetics of Cr-nitride layers. By measuring the thickness of

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