WIT Press

Residual Stress In Magnetron Sputtered TiN

Price

Free (open access)

Paper DOI

10.2495/SURF990011

Volume

25

Pages

1

Published

1999

Size

85 kb

Author(s)

E. Zoestbergen & J.T.M. De Hosson

Abstract

In this study magnetron sputtered TiN layers are investigated with X-ray diffraction. The measurements show that there is a texture present and in these layers a non-linear d-sinV behavior for the (200) planes was found. The latter cannot be explained by the well-known causes that may generate an oscillating d-sinV relation like shear stresses or a stress gradient. Assuming that the driving force behind the texture evolution is the ion bombardment, than the preferential orientation is a consequence from the dependence of the sputtering yield on grain orientation. This process may also have an influence on the atomic peening process, which is the main cause of stress generation. The a

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