WIT Press


Modeling Of Transient Enhanced Dopant Diffusion By Using A Moment-based Model Describing Point-defect Clustering

Price

Free (open access)

Paper DOI

10.2495/ES990191

Volume

22

Pages

10

Published

1999

Size

980 kb

Author(s)

D. Stiebel, P. Pichler and H. Ryssel

Abstract

The accurate simulation of the transient enhanced diffusion (TED) of do- pants during the post-implantation anneal is still a big challenge for process simulation. As a point-defect mediated process, the kinetics of TED is mainly determined by the interaction of intrinsic point defects with extended defects formed by point-defect agglomeration. Using a continuum model for the simulation, the reaction-diffusion equations describing the behavior of the species considered have to be solved numerically. In such an approach, a partial differential equation has to be solved for each kind and each size of extended defects. Because extended defects may consist of some hundred point defects, such models lead to inadmissibly high CPU times and CPU resources

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