WIT Press


A Convection-diffusion-migration BEM Model Applied To Multi-ion Electrochemical Systems

Price

Free (open access)

Paper DOI

10.2495/BE940041

Volume

7

Pages

8

Published

1994

Size

598 kb

Author(s)

Z.H. Qiu, L.C. Wrobel & H. Power

Abstract

A convection-difFusion-migration BEM model applied to multi-ion electrochemical systems Z.H. Qiu, L.C. Wrobel & H. Power Wessex Institute of Technology, University of Portsmouth, Ashurst Lodge, Ashurst, Southampton, SO40 7AA, UK INTRODUCTION This paper presents a boundary element scheme to predict the current density distribution and, consequently, the deposition of reacting species, in electrochem- ical systems of various natures. This is a problem of interest to many branches of the electrochemical industry, like plating, etching, anodizing, machining, etc. In all these electrochemical systems mass transport phenomena of charged species due to diffusion, convection and migration of electrical forces are strongly cou- pled with the electrochemical reactions at electrodes. It is therefore necessary to develop reliable numerical methods which can take into account all these effects. In an earlier paper [1], the authors have presented a BEM formulation for binary electrolytes consisti

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