WIT Press


A Computational Model Of Phase Changes In The Ni-Si System With Chemical Reactions

Price

Free (open access)

Paper DOI

10.2495/MB950381

Volume

13

Pages

8

Published

1995

Size

737 kb

Author(s)

P. Pfikryl, V. Chab & R. Cerny

Abstract

A computational model describing pulsed-laser induced chemical reactions in the thin nickel film - silicon system undergoing phase changes is formu- lated in the paper. The implementation of the model is performed using the finite element method. The moving boundary problem describing the behavior of the sample is solved by a front-fixing method combined with the successive approximation approach. The implementation of the model is discussed and typical results of numerical experiments are presented. A com

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