WIT Press

An Application Of A Dry Deposition Model Including The Chemical Reactions Of NO-NO2-O3

Price

Free (open access)

Paper DOI

10.2495/AIR950112

Volume

10

Pages

8

Published

1995

Size

605 kb

Author(s)

J. Padro, L. Zhang, W.J. Massman & D.W. Stocked

Abstract

An application of a dry deposition model including the chemical reactions of NO-NO^-O, J. Padro," L. Zhang/ W.J. Massman,* D.W. Stocked "Atmospheric Environment Service, 4905 Duffer in Street, Downsview, Ontario, Canada, M3H 5T4 *>Rocky Mountain Forest and Range Experiment Station, USDA Forest Service, Fort Collins, Colorado, USA 'EAWAG/ETH Zurich, Dubendorf, Switzerland Abstract A dry deposition model including chemical reactions for NO, NO? and Ck is developed with properties suitable as a module within larger Eulerian air quality models. The model is investigated with sensitivity tests and observations over grass. It appears that accurate NO surface emissions are needed for better comparison with traditional constant flux models and observations. 1 Introduction The need to include chemical reactions in models of dry depositions for NO, NO? and possibly O, has been demonstrated for example by Kramm et al.[l], and Arellano and Duynkerke [2]. Lenschow [3] explained that these chemic

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