WIT Press

Dry Deposition In A Model For Stochastic Particle Dispersion

Price

Free (open access)

Paper DOI

10.2495/AIR950102

Volume

10

Pages

8

Published

1995

Size

677 kb

Author(s)

E. Naslund & E. Karlsson

Abstract

A method for handling deposition in a stochastic particle model is formulated. In Eulerian models, the mass flow to the surface is usually calculated as the product of deposition velocity and concentration near the ground. Since most Lagrangian models calculate individual particle trajectories, such deposition models are not always suitable since concentrations at a specific time may not be accessible until after the simulation is done. Instead, our model is based on a probability approach and treats each particle separately. The total particle flux through a given surface, independent of deposition, is calculated from the particle statistics. This flux is then compared to the traditional formulation based on deposition velocity and amount of particles in a given volume. The probability for deposition is then the quota

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